Granted Patent
Utility
US 6,723,486 · App. 09/850,915
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
Inventors:
Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas I. Wallow
Patented Case
View Patent ↗
Granted: Apr 20, 2004
Filed: May 8, 2001
Inventors
Brian L. Goodall
Saikumar Jayaraman
Robert A. Shick
Larry F. Rhodes
Robert David Allen
Richard Anthony DiPietro
Thomas I. Wallow
Assignees (at issue)
SUMITOMO BAKELITE CO., LTD.
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.