Granted Patent
Utility
US 6,723,643 · App. 10/391,435
Method for chemical mechanical polishing of thin films using end-point indicator structures
Inventors:
Wei Pan, David R. Evans, Allen Burmaster
Patented Case
View Patent ↗
Granted: Apr 20, 2004
Filed: Mar 17, 2003
Inventors
Wei Pan
David R. Evans
Allen Burmaster
Assignee (at issue)
Sharp Laboratories of America, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.