Granted Patent
Utility
US 6,726,799 · App. 09/986,044
Plasma etching apparatus with focus ring and plasma etching method
Inventor:
Osamu Koike
Patented Case
View Patent ↗
Granted: Apr 27, 2004
Filed: Nov 7, 2001
Inventor
Osamu Koike
Assignee (at issue)
Semiconductor Leading Edge Technologies, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.