Granted Patent
Utility
US 6,727,191 · App. 09/792,989
High temperature hydrogen anneal of silicon wafers supported on a silicon fixture
Inventors:
Raanan Zehavi, James E. Boyle, Laurence D. Delaney
Patented Case
View Patent ↗
Granted: Apr 27, 2004
Filed: Feb 26, 2001
Inventors
Raanan Zehavi
James E. Boyle
Laurence D. Delaney
Assignee (at issue)
Integrated Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.