Granted Patent
Utility
US 6,730,587 · App. 09/731,006
Titanium barrier for nickel silicidation of a gate electrode
Inventors:
Jacques Bertrand, Christy Mei-Chu Woo, Minh Van Ngo, George Jonathan Kluth
Patented Case
View Patent ↗
Granted: May 4, 2004
Filed: Dec 7, 2000
Inventors
Jacques Bertrand
Christy Mei-Chu Woo
Minh Van Ngo
George Jonathan Kluth
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.