IP Library › Granted Patent US 6,730,600
Granted Patent Utility
US 6,730,600 · App. 10/259,256

Method of dry etching a semiconductor device in the absence of a plasma

Inventors: Nace Layadi, Simon John Molloy, Sailesh Mansinh Merchant, Isik C. Kizilyalli
Patented Case View Patent ↗
Granted: May 4, 2004 Filed: Sep 27, 2002
Inventors
Nace Layadi
Simon John Molloy
Sailesh Mansinh Merchant
Isik C. Kizilyalli
Assignee (at issue)
Agere Systems Inc.

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Quick Facts
Patent No.
US 6,730,600
App. No.
10/259,256
Filed
2002-09-27
Granted
2004-05-04
Kind
B2