Granted Patent
Utility
US 6,736,720 · App. 10/033,455
Apparatus and methods for controlling wafer temperature in chemical mechanical polishing
Inventors:
Nicolas Bright, David Hemker
Patented Case
View Patent ↗
Granted: May 18, 2004
Filed: Dec 26, 2001
Inventors
Nicolas Bright
David Hemker
Assignee (at issue)
Lam Research Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.