Granted Patent
Utility
US 6,737,358 · App. 10/076,129
Plasma etching uniformity control
Inventors:
Y. Long He, Albert Kwok, Tsukasa Abe, Han-Ming Wu
Patented Case
View Patent ↗
Granted: May 18, 2004
Filed: Feb 13, 2002
Inventors
Y. Long He
Albert Kwok
Tsukasa Abe
Han-Ming Wu
Assignee (at issue)
Intel Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.