Granted Patent
Utility
US 6,740,558 · App. 10/298,717
SiGe vertical gate contact for gate conductor post etch treatment
Inventor:
Klaus Hummler
Patented Case
View Patent ↗
Granted: May 25, 2004
Filed: Nov 18, 2002
Inventor
Klaus Hummler
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.