Granted Patent
Utility
US 6,740,569 · App. 10/248,361
Method of fabricating polysilicon film by excimer laser annealing process
Inventors:
Chu-Jung Shih, I-Min Lu
Patented Case
View Patent ↗
Granted: May 25, 2004
Filed: Jan 14, 2003
Inventors
Chu-Jung Shih
I-Min Lu
Assignee (at issue)
Toppoly Optoelectronics Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.