IP Library Granted Patent US 6,740,571
Granted Patent Utility
US 6,740,571 · App. 10/202,992

Method of etching a dielectric material in the presence of polysilicon

Inventor: Hua Ji
Patented Case View Patent ↗
Granted: May 25, 2004 Filed: Jul 25, 2002
Inventor
Hua Ji
Assignee (at issue)
MOSEL VITELIC INC.

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Quick Facts
Patent No.
US 6,740,571
App. No.
10/202,992
Filed
2002-07-25
Granted
2004-05-25
Kind
B2