Granted Patent
Utility
US 6,740,579 · App. 10/174,804
Method of making a semiconductor device that includes a dual damascene interconnect
Inventor:
Ebrahim Andideh
Patented Case
View Patent ↗
Granted: May 25, 2004
Filed: Jun 18, 2002
Inventor
Ebrahim Andideh
Assignee (at issue)
Intel Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.