IP Library Granted Patent US 6,740,891
Granted Patent Utility
US 6,740,891 · App. 09/989,700

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Inventors: Johannes C. Driessen, Hermanus M. J. R. Soemers, Michael J. M. Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
Patented Case View Patent ↗
Granted: May 25, 2004 Filed: Nov 21, 2001
Inventors
Johannes C. Driessen
Hermanus M. J. R. Soemers
Michael J. M. Renkens
Theodorus Hubertus Josephus Bisschops
Johannes Petrus Martinus Bernardus Vermeulen
Antonius Maria Rijken
Assignee (at issue)
ASML NETHERLANDS B.V.

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Quick Facts
Patent No.
US 6,740,891
App. No.
09/989,700
Filed
2001-11-21
Granted
2004-05-25
Kind
B2