Granted Patent
Utility
US 6,743,642 · App. 10/289,488
Bilayer CMP process to improve surface roughness of magnetic stack in MRAM technology
Inventors:
Gregory Costrini, John P. Hummel, Kia-Seng Low, Mahadevaiyer Krishnan
Patented Case
View Patent ↗
Granted: Jun 1, 2004
Filed: Nov 6, 2002
Inventors
Gregory Costrini
John P. Hummel
Kia-Seng Low
Mahadevaiyer Krishnan
Assignees (at issue)
International Business Machines Corporation
Infineon Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.