Granted Patent
Utility
US 6,749,671 · App. 10/358,972
Abatement of effluents from chemical vapor deposition processes using organometallic source reagents
Inventors:
Mark Holst, Ray Dubois, Jose I. Arno, Rebecca Faller, Glenn M. Tom
Patented Case
View Patent ↗
Granted: Jun 15, 2004
Filed: Feb 5, 2003
Inventors
Mark Holst
Ray Dubois
Jose I. Arno
Rebecca Faller
Glenn M. Tom
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.