Granted Patent
Utility
US 6,762,129 · App. 09/826,098
Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
Inventors:
Takeshi Yamashita, Takao Yamaguchi, Hideo Niko
Patented Case
View Patent ↗
Granted: Jul 13, 2004
Filed: Apr 5, 2001
Inventors
Takeshi Yamashita
Takao Yamaguchi
Hideo Niko
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.