Granted Patent
Utility
US 6,770,895 · App. 10/300,898
Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
Inventor:
Stephen Roux
Patented Case
View Patent ↗
Granted: Aug 3, 2004
Filed: Nov 21, 2002
Inventor
Stephen Roux
Assignee (at issue)
ASML Holding N.V.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.