IP Library Granted Patent US 6,773,853
Granted Patent Utility
US 6,773,853 · App. 09/985,004

Semiconductor device manufacture method with exposure process using small exposure amount, and reticle set for semiconductor device manufacture

Inventors: Takayoshi Minami, Toshio Sawano
Patented Case View Patent ↗
Granted: Aug 10, 2004 Filed: Nov 1, 2001
Inventors
Takayoshi Minami
Toshio Sawano
Assignee (at issue)
Fujitsu Limited

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Quick Facts
Patent No.
US 6,773,853
App. No.
09/985,004
Filed
2001-11-01
Granted
2004-08-10
Kind
B2