Granted Patent
Utility
US 6,773,853 · App. 09/985,004
Semiconductor device manufacture method with exposure process using small exposure amount, and reticle set for semiconductor device manufacture
Inventors:
Takayoshi Minami, Toshio Sawano
Patented Case
View Patent ↗
Granted: Aug 10, 2004
Filed: Nov 1, 2001
Inventors
Takayoshi Minami
Toshio Sawano
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.