IP Library Granted Patent US 6,774,012
Granted Patent Utility
US 6,774,012 · App. 10/290,841

Furnace system and method for selectively oxidizing a sidewall surface of a gate conductor by oxidizing a silicon sidewall in lieu of a refractory metal sidewall

Inventor: Sundar Narayanan
Patented Case View Patent ↗
Granted: Aug 10, 2004 Filed: Nov 8, 2002
Inventor
Sundar Narayanan
Assignee (at issue)
Cypress Semiconductor Corporation

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Quick Facts
Patent No.
US 6,774,012
App. No.
10/290,841
Filed
2002-11-08
Granted
2004-08-10
Kind
B1