Granted Patent
Utility
US 6,774,053 · App. 10/384,350
Method and structure for low-k dielectric constant applications
Inventors:
Errol Todd Ryan, Cindy Goldberg, Yuri Solomentsev, Yeong-Jyh T. Lii
Patented Case
View Patent ↗
Granted: Aug 10, 2004
Filed: Mar 7, 2003
Inventors
Errol Todd Ryan
Cindy Goldberg
Yuri Solomentsev
Yeong-Jyh T. Lii
Assignees (at issue)
Freeescale Semiconductor, Inc.
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.