Granted Patent
Utility
US 6,777,138 · App. 10/099,279
Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout
Inventors:
Christophe Pierrat, Youping Zhang
Patented Case
View Patent ↗
Granted: Aug 17, 2004
Filed: Mar 15, 2002
Inventors
Christophe Pierrat
Youping Zhang
Assignee (at issue)
Numerical Technologies, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.