Granted Patent
Utility
US 6,784,075 · App. 10/237,608
Method of forming shallow trench isolation with silicon oxynitride barrier film
Inventors:
Tzu-Kun Ku, Chian-Kai Huang
Patented Case
View Patent ↗
Granted: Aug 31, 2004
Filed: Sep 10, 2002
Inventors
Tzu-Kun Ku
Chian-Kai Huang
Assignee (at issue)
Silicon Integrated Systems Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.