Granted Patent
Utility
US 6,787,293 · App. 10/395,649
Photoresist residue remover composition
Inventors:
Takuo Oowada, Norio Ishikawa, Hidemitsu Aoki, Kenichi Nakabeppu, Yoshiko Kasama
Patented Case
View Patent ↗
Granted: Sep 7, 2004
Filed: Mar 21, 2003
Inventors
Takuo Oowada
Norio Ishikawa
Hidemitsu Aoki
Kenichi Nakabeppu
Yoshiko Kasama
Assignees (at issue)
Kanto Kagaku Kabushiki Kaisha
NEC Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.