Granted Patent
Utility
US 6,790,579 · App. 09/630,894
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
Inventors:
Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes
Patented Case
View Patent ↗
Granted: Sep 14, 2004
Filed: Aug 2, 2000
Inventors
Brian L. Goodall
Saikumar Jayaraman
Robert A. Shick
Larry F. Rhodes
Assignee (at issue)
SUMITOMO BAKELITE CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.