Granted Patent
Utility
US 6,790,719 · App. 10/410,043
Process for forming dual metal gate structures
Inventors:
Olubunmi O. Adetutu, Eric D. Luckowski, Srikanth B. Samavedam, Arturo Martinez
Patented Case
View Patent ↗
Granted: Sep 14, 2004
Filed: Apr 9, 2003
Inventors
Olubunmi O. Adetutu
Eric D. Luckowski
Srikanth B. Samavedam
Arturo Martinez
Assignee (at issue)
Freeescale Semiconductor, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.