Granted Patent
Utility
US 6,791,155 · App. 10/251,550
Stress-relieved shallow trench isolation (STI) structure and method for forming the same
Inventors:
Guo-Qiang Lo, Brian Schorr, Gary Foley, Shih-Ked Lee
Patented Case
View Patent ↗
Granted: Sep 14, 2004
Filed: Sep 20, 2002
Inventors
Guo-Qiang Lo
Brian Schorr
Gary Foley
Shih-Ked Lee
Assignee (at issue)
Integrated Device Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.