IP Library › Granted Patent US 6,792,889
Granted Patent Utility
US 6,792,889 · App. 10/353,760

Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power

Inventors: Akira Nakano, Tadahiro Ohmi
Patented Case View Patent ↗
Granted: Sep 21, 2004 Filed: Jan 28, 2003
Inventors
Akira Nakano
Tadahiro Ohmi
Assignees (at issue)
ALPS ELECTRIC CO., LTD.
Tadahiro Ohmi

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Quick Facts
Patent No.
US 6,792,889
App. No.
10/353,760
Filed
2003-01-28
Granted
2004-09-21
Kind
B2