Granted Patent
Utility
US 6,797,440 · App. 10/213,344
Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device
Inventors:
Cesar M. Garza, Wei E. Wu, Bernard J. Roman, Pawitter Mangat, Kevin J. Nordquist, William J. Dauksher
Patented Case
View Patent ↗
Granted: Sep 28, 2004
Filed: Aug 6, 2002
Inventors
Cesar M. Garza
Wei E. Wu
Bernard J. Roman
Pawitter Mangat
Kevin J. Nordquist
William J. Dauksher
Assignee (at issue)
Freeescale Semiconductor, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.