Granted Patent
Utility
US 6,797,649 · App. 10/343,508
Method for depositing a fluorine-doped silica film
Inventors:
Karin Scherer, Pascale Lacan, Richard Bosmans
Patented Case
View Patent ↗
Granted: Sep 28, 2004
Filed: Jul 25, 2003
Inventors
Karin Scherer
Pascale Lacan
Richard Bosmans
Assignee (at issue)
Essilor International (Compagnie Generale d'Optique)
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.