Granted Patent
Utility
US 6,798,065 · App. 09/955,677
Method and apparatus for high-resolution in-situ plasma etching of inorganic and metals films
Inventors:
Shao-Wen Hsia, Michael Berg, Maureen R. Brongo
Patented Case
View Patent ↗
Granted: Sep 28, 2004
Filed: Sep 19, 2001
Inventors
Shao-Wen Hsia
Michael Berg
Maureen R. Brongo
Assignee (at issue)
Newport Fab, LLC
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.