Granted Patent
Utility
US 6,800,423 · App. 10/294,618
Radiation-sensitive composition and method for forming patterns and fabricating semiconductor devices
Inventors:
Yoshiyuki Yokoyama, Takashi Hattori
Patented Case
View Patent ↗
Granted: Oct 5, 2004
Filed: Nov 15, 2002
Inventors
Yoshiyuki Yokoyama
Takashi Hattori
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.