Granted Patent
Utility
US 6,800,512 · App. 09/662,004
Method of forming insulating film and method of fabricating semiconductor device
Inventors:
Kazuichiro Itonaga, Akihiro Yamamoto, Hiroaki Nakaoka, Isao Miyanaga, Yoshinao Harada
Patented Case
View Patent ↗
Granted: Oct 5, 2004
Filed: Sep 14, 2000
Inventors
Kazuichiro Itonaga
Akihiro Yamamoto
Hiroaki Nakaoka
Isao Miyanaga
Yoshinao Harada
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.