Granted Patent
Utility
US 6,803,554 · App. 10/703,732
System and method for lithography process monitoring and control
Inventors:
Jun Ye, R. Fabian W. Pease, Xun Chen
Patented Case
View Patent ↗
Granted: Oct 12, 2004
Filed: Nov 7, 2003
Inventors
Jun Ye
R. Fabian W. Pease
Xun Chen
Assignee (at issue)
Brion Technologies, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.