Granted Patent
Utility
US 6,805,728 · App. 10/314,727
Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
Inventors:
Joseph D. Sweeney, Paul J. Marganski, W. Karl Olander, Luping Wang
Patented Case
View Patent ↗
Granted: Oct 19, 2004
Filed: Dec 9, 2002
Inventors
Joseph D. Sweeney
Paul J. Marganski
W. Karl Olander
Luping Wang
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.