Granted Patent
Utility
US 6,806,537 · App. 10/192,657
Semiconductor device having offset insulation film formed on insulation film, and method of manufacturing the same
Inventors:
Takuji Matsumoto, Hirokazu Sayama, Shigenobu Maeda, Toshiaki Iwamatsu, Kazunobu Ota
Patented Case
View Patent ↗
Granted: Oct 19, 2004
Filed: Jul 11, 2002
Inventors
Takuji Matsumoto
Hirokazu Sayama
Shigenobu Maeda
Toshiaki Iwamatsu
Kazunobu Ota
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.