Granted Patent
Utility
US 6,808,978 · App. 10/330,436
Method for fabricating metal electrode with atomic layer deposition (ALD) in semiconductor device
Inventor:
Younsoo Kim
Patented Case
View Patent ↗
Granted: Oct 26, 2004
Filed: Dec 30, 2002
Inventor
Younsoo Kim
Assignee (at issue)
SK hynix Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.