Granted Patent
Utility
US 6,809,039 · App. 09/940,247
Method for forming a silicide layer
Inventor:
Takamasa Ito
Patented Case
View Patent ↗
Granted: Oct 26, 2004
Filed: Aug 27, 2001
Inventor
Takamasa Ito
Assignee (at issue)
NEC Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.