IP Library Granted Patent US 6,815,148
Granted Patent Utility
US 6,815,148 · App. 10/173,037

Method of manufacturing a semiconductor device and designing a mask pattern

Inventor: Akira Matsumoto
Patented Case View Patent ↗
Granted: Nov 9, 2004 Filed: Jun 18, 2002
Inventor
Akira Matsumoto
Assignee (at issue)
NEC Electronics Corporation

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Quick Facts
Patent No.
US 6,815,148
App. No.
10/173,037
Filed
2002-06-18
Granted
2004-11-09
Kind
B2