Granted Patent
Utility
US 6,815,308 · App. 10/219,168
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
Inventors:
Richard Holscher, Niroomand Ardavan
Patented Case
View Patent ↗
Granted: Nov 9, 2004
Filed: Aug 15, 2002
Inventors
Richard Holscher
Niroomand Ardavan
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.