Granted Patent
Utility
US 6,818,362 · App. 10/782,566
Photolithography reticle design
Inventors:
Kevin Lucas, Robert Boone, Lloyd C. Litt, Wei E. Wu
Patented Case
View Patent ↗
Granted: Nov 16, 2004
Filed: Feb 19, 2004
Inventors
Kevin Lucas
Robert Boone
Lloyd C. Litt
Wei E. Wu
Assignee (at issue)
Freeescale Semiconductor, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.