Granted Patent
Utility
US 6,818,558 · App. 10/185,470
Method of manufacturing a dielectric layer for a silicon-oxide-nitride-oxide-silicon (SONOS) type devices
Inventors:
Manuj Rathor, Krishnaswamy Ramkumar, Fred Jenne, Loren T. Lancaster
Patented Case
View Patent ↗
Granted: Nov 16, 2004
Filed: Jun 28, 2002
Inventors
Manuj Rathor
Krishnaswamy Ramkumar
Fred Jenne
Loren T. Lancaster
Assignee (at issue)
Cypress Semiconductor Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.