Granted Patent
Utility
US 6,818,563 · App. 10/366,054
Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzles
Inventors:
Richard Novak, Ismail Kashkoush, Gim-Syang Chen, Dennis Nemeth
Patented Case
View Patent ↗
Granted: Nov 16, 2004
Filed: Feb 13, 2003
Inventors
Richard Novak
Ismail Kashkoush
Gim-Syang Chen
Dennis Nemeth
Assignee (at issue)
Akrion, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.