Granted Patent
Utility
US 6,821,187 · App. 10/148,241
Method for chemical-mechanical polishing of a layer which is a substrate and is a metal selected from a platinum group
Inventors:
Gerhard Beitel, Annette Saenger, Gerd Mainka, Rainer Florian Schnabel
Patented Case
View Patent ↗
Granted: Nov 23, 2004
Filed: Oct 15, 2002
Inventors
Gerhard Beitel
Annette Saenger
Gerd Mainka
Rainer Florian Schnabel
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.