Granted Patent
Utility
US 6,821,869 · App. 10/139,379
Photomask, method of generating resist pattern, and method of fabricating master information carrier
Inventors:
Terumi Yanagi, Nobuyuki Komura, Tatsuaki Ishida, Keizo Miyata
Patented Case
View Patent ↗
Granted: Nov 23, 2004
Filed: May 7, 2002
Inventors
Terumi Yanagi
Nobuyuki Komura
Tatsuaki Ishida
Keizo Miyata
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.