Granted Patent
Utility
US 6,821,871 · App. 09/879,122
Method for manufacturing semiconductor device, substrate treatment method, and semiconductor manufacturing apparatus
Inventors:
Hisashi Nomura, Yushin Takasawa, Hajime Karasawa, Yoshinori Imai, Tadanori Yoshida, Kenichi Yamaguchi
Patented Case
View Patent ↗
Granted: Nov 23, 2004
Filed: Jun 13, 2001
Inventors
Hisashi Nomura
Yushin Takasawa
Hajime Karasawa
Yoshinori Imai
Tadanori Yoshida
Kenichi Yamaguchi
Assignees (at issue)
Hitachi Kokusai Electric Inc.
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.