IP Library Granted Patent US 6,822,291
Granted Patent Utility
US 6,822,291 · App. 10/365,634

Optimized gate implants for reducing dopant effects during gate etching

Inventors: Calvin T. Gabriel, Tammy Zheng, Emmanuel de Muizon, Linda Leard
Patented Case View Patent ↗
Granted: Nov 23, 2004 Filed: Feb 11, 2003
Inventors
Calvin T. Gabriel
Tammy Zheng
Emmanuel de Muizon
Linda Leard
Assignee (at issue)
KONINKLIJKE PHILIPS ELECTRONICS NV

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Quick Facts
Patent No.
US 6,822,291
App. No.
10/365,634
Filed
2003-02-11
Granted
2004-11-23
Kind
B2