IP Library › Granted Patent US 6,824,932
Granted Patent Utility
US 6,824,932 · App. 10/164,242

Self-aligned alternating phase shift mask patterning process

Inventors: Scott Bukofsky, Carlos A. Fonseca, Michael S. Hibbs, Lars Liebmann
Patented Case View Patent ↗
Granted: Nov 30, 2004 Filed: Jun 5, 2002
Inventors
Scott Bukofsky
Carlos A. Fonseca
Michael S. Hibbs
Lars Liebmann
Assignee (at issue)
International Business Machines Corporation

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,824,932
App. No.
10/164,242
Filed
2002-06-05
Granted
2004-11-30
Kind
B2