Granted Patent
Utility
US 6,824,949 · App. 10/008,796
Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
Inventors:
Jörg Haussmann, Gerhard Maier, Günter Schmid, Recai Sezi
Patented Case
View Patent ↗
Granted: Nov 30, 2004
Filed: Nov 13, 2001
Inventors
Jörg Haussmann
Gerhard Maier
Günter Schmid
Recai Sezi
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.