Granted Patent
Utility
US 6,826,451 · App. 10/225,343
Lithography tool having a vacuum reticle library coupled to a vacuum chamber
Inventors:
Santiago del Puerto, Markus Franciscus Antonius Eurlings
Patented Case
View Patent ↗
Granted: Nov 30, 2004
Filed: Aug 22, 2002
Inventors
Santiago del Puerto
Markus Franciscus Antonius Eurlings
Assignee (at issue)
ASML Holding N.V.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.