Granted Patent
Utility
US 6,828,249 · App. 10/102,546
System and method for enhanced monitoring of an etch process
Inventors:
Catherine Odor, Richard A. Chapman
Patented Case
View Patent ↗
Granted: Dec 7, 2004
Filed: Mar 20, 2002
Inventors
Catherine Odor
Richard A. Chapman
Assignee (at issue)
Infineon Technologies Richmond, LP
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.